Sakamoto, Moritsugu

Institute of GIGAKU, Nagaoka University of TechnologyAssistant Professor*Profile is at the time of the award.

2018Inamori Research GrantsScience & Engineering

Research topics
Development of High-resolution photolithography using coaxial interference of optical vortices
Photolithography is a technology essential for the development of electronic/optical devices, which requires microfabrication of metallic structures. In its “exposure” process, either mask exposure or laser direct imaging exposure is chosen. Both methods have advantages and disadvantages: the former achieves a high resolution, although it lacks flexibility in drawing patterns, while the latter is the opposite. If we can combine the features of the two, we will have a very useful type of photolithography.
With laser direct imaging exposure, the resolution of drawing patterns leaves something to be desired because convergence of Gaussian beams is subject to the diffraction limit of light. If this technological bottleneck can be resolved for laser direct imaging exposure, we will have superior photolithography both in terms of resolution and flexibility, as mentioned earlier. The goal of this research project is to establish a new photolithography technique based on the laser direct imaging method that allows microfabrication beyond the diffraction limit by taking advantage of phase singularity of the optical vortex.

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I am absolutely delighted to have received the prestigious research grant of the Inamori Foundation. I will move ahead further with my research to produce results for practical use.

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